The Series AR710 HFADD is designed for trace gas analysis of impurities in argon.

Applications: specialty gas manufacturers, industrial processes requiring inert argon, the electronics industry, gas separation plants, air separation plants, nuclear industry, certification of argon purity, semiconductor industry

Analysis of trace H2, O2, N2, CH4, CO and CO2 in high purity argon (ppb)

Sensitivity — H2: < 15 ppb; O2: < 75 ppb; N2: < 100 ppb; CH4: < 30 ppb;
CO: < 200 ppb; CO2: <100 ppb

Analytical cycle: all components < 10 minutes

High analytical precision: ± 1% full scale

High stability and reproducibility

Output: 0-100 mV; 4-20 mA (optional)

Options: automatic or manual operation modes, auto-zero

On-line monitoring by linking workstation

Installation: bench or 19” rack

Power: 110-220 V, 50-60 Hz